The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 03, 2017
Filed:
Sep. 17, 2013
Applicant:
Electronics and Telecommunications Research Institute, Daejeon, KR;
Inventors:
Dae-Sik Lee, Daejeon, KR;
Jeong Won Park, Daejeon, KR;
Seong-Mok Cho, Daejeon, KR;
Moon Youn Jung, Daejeon, KR;
Assignee:
ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE, Daejeon, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01D 21/00 (2006.01); G01N 27/74 (2006.01); B29C 65/70 (2006.01); B29C 65/72 (2006.01); G01R 33/12 (2006.01); G01R 33/038 (2006.01); B82Y 5/00 (2011.01); H01F 1/00 (2006.01);
U.S. Cl.
CPC ...
G01N 27/745 (2013.01); B29C 65/70 (2013.01); B29C 65/72 (2013.01); G01R 33/0385 (2013.01); G01R 33/1269 (2013.01); B82Y 5/00 (2013.01); H01F 1/0054 (2013.01);
Abstract
Provided are a multiple discrimination device and a method of manufacturing the same. According to the multiple discrimination device, a three-dimensional micro ferromagnetic pattern is optimally designed and arranged to allow a magnetic force applied to a discrimination-target particle to be discriminated to be well controlled to perform discrimination well. The method employs a semiconductor processing technology, thereby precisely manufacturing and allowing mass production.