The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 03, 2017

Filed:

May. 09, 2013
Applicant:

Advanced Micro-fabrication Equipment Inc, Shanghai, Shanghai, CN;

Inventors:

Yong Jiang, Shanghai, CN;

Ning Zhou, Shanghai, CN;

Henry Ho, Shanghai, CN;

Zhiyou Du, Shanghai, CN;

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 16/455 (2006.01); C30B 25/14 (2006.01); F16L 53/00 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
F16L 53/00 (2013.01); C23C 16/45514 (2013.01); C23C 16/45517 (2013.01); C23C 16/45565 (2013.01); C23C 16/45572 (2013.01); C23C 16/45574 (2013.01); C23C 16/45578 (2013.01); C30B 25/14 (2013.01); H01L 21/67109 (2013.01); Y10T 137/0402 (2015.04); Y10T 137/6416 (2015.04);
Abstract

The present application provides a gas showerhead including a gas distribution and diffusion plate and a water cooling plate, the gas distribution and diffusion plate includes several columns of first gas diffusion passages connecting to a first reactant gas source and several columns of second gas diffusion passages connecting to a second reactant gas source; the water cooling plate having cooling liquid passages is arranged below the gas distribution and diffusion plate, and the water cooling plate is provided with first gas outlet passages provided for the reactant gas in the first gas diffusion passages to flow out and second gas outlet passages provided for the reactant gas in the second gas diffusion passages to flow out, so as to isolatedly feed at least two reactant gases into a reaction chamber.


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