The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 03, 2017

Filed:

Aug. 13, 2013
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Florian Ries, Westerngrund, DE;

Stefan Hein, Blankenbach, DE;

Stefan Lorenz, Karlstein, DE;

Neil Morrison, Darmstadt, DE;

Tobias Stolley, Oberursel, DE;

Assignee:

APPLIED MATERIALS, INC., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C25F 1/00 (2006.01); C23C 16/44 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
C23C 16/4405 (2013.01); H01J 37/3277 (2013.01); H01J 37/32862 (2013.01); Y10T 428/18 (2015.01); Y10T 428/192 (2015.01);
Abstract

According to the present disclosure, a method for cleaning the processing chamber of a flexible substrate processing apparatus without breaking the vacuum in the processing chamber is provided. The method for cleaning the processing chamber includes guiding a sacrificial foil into the processing chamber; initiating a first pump process in the processing chamber; plasma cleaning the processing chamber while the sacrificial foil is provided in the processing chamber; initiating a second pump process in the processing chamber; and guiding a flexible substrate into the processing chamber.


Find Patent Forward Citations

Loading…