The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 03, 2017
Filed:
Sep. 14, 2010
Sophie Besson, Paris, FR;
Maxime Duran, Cavanac, FR;
Emmanuel Garre, Le Vesinet, FR;
Carole Gentilhomme, Aulnay-sous-Bois, FR;
Emilie Viasnoff, Sevres, FR;
Corinne Victor, Saint-Leu la Foret, FR;
Thierry Gay, Cluny, FR;
Sophie Besson, Paris, FR;
Maxime Duran, Cavanac, FR;
Emmanuel Garre, Le Vesinet, FR;
Carole Gentilhomme, Aulnay-sous-Bois, FR;
Emilie Viasnoff, Sevres, FR;
Corinne Victor, Saint-Leu la Foret, FR;
Thierry Gay, Cluny, FR;
CertainTeed Corporation, Malvern, PA (US);
Abstract
The purpose of the invention is a process for obtaining a material comprising a substrate at least part of whose surface and at least one of whose faces is based on organic compounds, the said process being implemented at atmospheric pressure comprises moreover the following stages: In the immediate vicinity of the said substrate a zone containing active species of a non-thermal plasma is created; into the said zone is injected at least one precursor of a chemical element so as to deposit upon at least one face of the said substrate (at least part of whose surface comprises an organic compound base), a first thin layer capable of protecting the said substrate against oxidation reactions, specifically those due to radicals. A further purpose of the invention is the material obtainable according to this process.