The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 03, 2017

Filed:

Jun. 07, 2012
Applicants:

Frank Torregrosa, Simiane, FR;

Laurent Roux, Marseilles, FR;

Inventors:

Frank Torregrosa, Simiane, FR;

Laurent Roux, Marseilles, FR;

Assignee:

ION BEAM SERVICES, Peynier, FR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); C23C 14/48 (2006.01);
U.S. Cl.
CPC ...
C23C 14/48 (2013.01); H01J 37/3233 (2013.01); H01J 37/32174 (2013.01); H01J 37/32357 (2013.01); H01J 37/32412 (2013.01); H01J 37/32422 (2013.01); H01J 37/32706 (2013.01);
Abstract

An ion implantation machine includes an enclosure that is connected to a pump device, a negatively polarized substrate-carrier that is arranged inside the enclosure, and a plasma feed device in the form of a generally cylindrical body extending between an initial section and a terminal section, the device having a main chamber provided with an ionization cell, the main chamber being provided with a gas delivery orifice, and the final section of the main chamber being provided with a head-loss component for creating a pressure drop relative to the body. Furthermore, the plasma feed device also includes an auxiliary chamber arranged beyond the final section, the auxiliary chamber opening out into the enclosure at the terminal section.


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