The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 03, 2017

Filed:

Dec. 01, 2015
Applicant:

3m Innovative Properties Company, St. Paul, MN (US);

Inventors:

Robin E. Wright, Hudson, WI (US);

Margaux B. Mitera, New Richmond, WI (US);

Richard L. Walter, St. Paul, MN (US);

Jayshree Seth, Woodbury, MN (US);

Janet A. Venne, Roseville, MN (US);

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C08F 2/46 (2006.01); C08F 2/50 (2006.01); C09D 133/14 (2006.01); C09J 7/02 (2006.01); B05D 3/06 (2006.01); C09D 183/06 (2006.01); D21H 19/10 (2006.01); D21H 25/08 (2006.01); B05D 5/08 (2006.01); C08G 77/20 (2006.01);
U.S. Cl.
CPC ...
C09D 133/14 (2013.01); B05D 3/065 (2013.01); C09D 183/06 (2013.01); C09J 7/0228 (2013.01); D21H 19/10 (2013.01); D21H 25/08 (2013.01); B05D 5/08 (2013.01); B05D 2252/00 (2013.01); C08G 77/20 (2013.01); C09J 2205/31 (2013.01); C09J 2483/005 (2013.01); Y10T 428/1476 (2015.01);
Abstract

Methods for producing an at least partially cured layer by applying a layer including a (meth)acrylate-functional siloxane to a surface of a substrate, and irradiating the layer in a substantially inert atmosphere with a short wavelength polychromatic ultraviolet light source having a peak intensity at a wavelength of from about 160 nanometers to about 240 nanometers to at least partially cure the layer. Optionally, the layer is at a curing temperature greater than 25° C. In some embodiments, the layer has a thickness of about 0.1 micrometers to about 1 micrometer. In certain embodiments, the layer is substantially free of a photoinitiator and/or an organic solvent. In some particular embodiments, irradiating the layer with a short wavelength polychromatic ultraviolet light source takes place in an inert atmosphere including no greater than 50 ppm oxygen. The substantially cured layer may be a release layer or a low adhesion backsize (LAB).


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