The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 03, 2017
Filed:
Jul. 14, 2008
Oleksandr P. Dzyubak, Rochester, MN (US);
Andrew N. Primak, Cleveland, OH (US);
Cynthia H. Mccollough, Byron, MN (US);
Oleksandr P. Dzyubak, Rochester, MN (US);
Andrew N. Primak, Cleveland, OH (US);
Cynthia H. McCollough, Byron, MN (US);
MAYO FOUNDATION FOR MEDICAL EDUCATION AND RESEARCH, Rochester, MN (US);
Abstract
Contrast from dual energy CT images is removed without affecting other aspects of the image, including objects surrounded by contrast. Dual energy images are acquired during a study of a subject. First, a binary mask image ('Contrast localizer') is produced to localize the contrast-enhanced areas and build sets of images with contrast-enhanced areas only ('Contrast images') and complement images with contrast-enhanced areas removed (“Contrast complement images”) for both low and high x-ray beam energy image sets. Only the contrast images are used for dual energy contrast subtraction. Second binary mask image (“Subject localizer”) is produced to localize the objects under study. This mask image is used to reconstruct both low and high energy image sets with contrast selectively removed and subject present.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile