The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 27, 2016

Filed:

Mar. 03, 2016
Applicant:

Kabushiki Kaisha Toshiba, Tokyo, JP;

Inventor:

Tomonori Aoyama, Mie, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); H05B 6/64 (2006.01); H01L 21/324 (2006.01); H01L 21/67 (2006.01); H05B 6/70 (2006.01);
U.S. Cl.
CPC ...
H05B 6/6411 (2013.01); H01L 21/324 (2013.01); H01L 21/67115 (2013.01); H05B 6/708 (2013.01);
Abstract

In accordance with an embodiment, a microwave irradiation apparatus includes a chamber and a polarizing plate. The chamber is configured to accommodate a substrate and is provided with an introduction port to introduce the microwave applied to the substrate from a direction at an angle within a range of ±45 degrees to a direction horizontal to a surface of the substrate. The polarizing plate is installed between the introduction port and the substrate, and selectively transmits a microwave where an amplitude direction of a magnetic field or an electric field is vertical to the surface of the substrate.


Find Patent Forward Citations

Aoyama, Tomonori. (2016). Microwave irradiation apparatus and substrate treatment method (U.S. Patent No. 9532409). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9532409

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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