The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 27, 2016
Filed:
Dec. 31, 2013
Springpower International Incorporated, Mississauga, CA;
Xueliang Sun, London, CA;
Yuhai Hu, London, CA;
Xifei Li Li, London, CA;
Ruying Li, London, CA;
Quanmin Yang, Mississauga, CA;
SPRINGPOWER INTERNATIONAL INCORPORATED, Mississauga, Ontario, CA;
Abstract
This invention provides a method for mass production of silicon nanowires and/or nanobelts. The invented method is a chemical etching process employing an etchant that preferentially etches and removes other phases from a multiphase silicon alloy, over a silicon phase, and allows harvesting of the residual silicon nanowires and/or nanobelts. The silicon alloy comprises, or is treated so as to comprise, one-dimensional and/or two-dimensional silicon nanostructures in the microstructure of the multi-phase silicon alloy prior to etching. When used as anode for secondary lithium batteries, the silicon nanowires or nanobelts produced by the invented method exhibit high storage capacity.