The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 27, 2016

Filed:

Feb. 27, 2009
Applicant:

Dennis Teers, Worcs, GB;

Inventor:

Dennis Teers, Worcs, GB;

Assignee:

Applied Multilayers LLC, Battle Ground, WA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/24 (2006.01); H01J 37/34 (2006.01); C23C 14/34 (2006.01); C23C 14/35 (2006.01); C23C 14/50 (2006.01); C23C 14/56 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3447 (2013.01); C23C 14/3492 (2013.01); C23C 14/352 (2013.01); C23C 14/505 (2013.01); C23C 14/568 (2013.01); H01J 37/3405 (2013.01);
Abstract

The invention relates to a method and apparatus for the generation of multilayered coatings onto substrates. Typically the apparatus used is a closed field unbalanced magnetron configuration in conjunction with one or more cylindrical and rotatable shields and a substrate carrier on which the substrates to be coated are carried. The shields and substrate holder are provided for rotation about a common axis of rotation. The shields are provided with apertures to allow the selective positioning of the apertures to define a passage or passages along which material from the targets can pass onto the substrates. The targets can be cleaned prior to the coating stage by operation of the targets with the shields selectively positioned to prevent the deposited material from reaching the substrates.


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