The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 27, 2016

Filed:

Jan. 19, 2016
Applicant:

Canon Kabushiki Kaisha, Tokyo, JP;

Inventors:

Tomoyuki Oike, Honjo, JP;

Yoshinori Shibutani, Tokyo, JP;

Nobuhiro Yasui, Yokohama, JP;

Toru Den, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01T 1/20 (2006.01); G21K 4/00 (2006.01); G01T 1/202 (2006.01);
U.S. Cl.
CPC ...
G21K 4/00 (2013.01); G01T 1/202 (2013.01); G01T 1/2018 (2013.01); G21K 2004/06 (2013.01);
Abstract

A method is provided for manufacturing a scintillator panel including a substrate and a scintillator layer containing a plurality of crystals formed by depositing a scintillator material on a deposition surface of the substrate. The method includes depositing the scintillator material on the deposition surface of the substrate such that the scintillator material incidents on the deposition surface obliquely with respect to the normal to the deposition surface, and varying the angle between a reference direction on the deposition surface and a projected incident direction that is obtained by projecting the direction of the scintillator material incident onto the deposition surface. In the vapor deposition, the amount of the scintillator material deposited on the deposition surface changes according to the angle between the projected incident direction and the reference direction.


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