The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 27, 2016
Filed:
Mar. 05, 2015
Novatek Microelectronics Corp., Hsin-Chu, TW;
Jau-Hong Kao, Hsinchu County, TW;
Shiang-Fei Wang, Tainan, TW;
Yi-Jen Wu, Hsinchu County, TW;
Chih-Huang Lin, Hsinchu, TW;
Min-Hui Chu, Hsinchu County, TW;
Hong-Chu Chen, Hsinchu, TW;
Chi-Fan Liou, Taoyuan, TW;
NOVATEK Microelectronics Corp., Hsin-Chu, TW;
Abstract
A method for generating masking image using general polygonal mask includes receiving a pixel of a raw image and a polygon vertices array corresponding to a polygonal mask, determining whether the pixel is inside the polygonal mask, labeling the pixel to be a masked pixel if the pixel is inside the polygonal mask, or labeling the pixel to be a visible pixel if the pixel is outside the polygonal mask, and outputting the masked pixel or the visible pixel to generate the masking image.