The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 27, 2016
Filed:
Jun. 27, 2013
Applicants:
Eun-su Rho, Chungcheongnam-do, KR;
Jeong-yong Bae, Chungcheongnam-do, KR;
Inventors:
Eun-Su Rho, Chungcheongnam-do, KR;
Jeong-Yong Bae, Chungcheongnam-do, KR;
Assignee:
Semes Co., Ltd., , KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B08B 3/00 (2006.01); G03F 7/42 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
G03F 7/422 (2013.01); G03F 7/423 (2013.01); H01L 21/6708 (2013.01);
Abstract
A method for processing a substrate includes arranging the substrate on which a photoresist layer is formed and providing a treatment liquid for removing the photoresist layer on the substrate. The method also includes providing a mist including deionized water or hydrogen peroxide on the substrate to make contact with the treatment liquid so as to increase a temperature of the treatment liquid. Therefore, efficiency of removing the photoresist layer may be improved.