The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 27, 2016
Filed:
Oct. 17, 2012
Commissariat a L'energie Atomique ET Aux Ene Alt, Paris, FR;
Michel Heitzmann, Crolles, FR;
Abstract
A method producing a refractive or diffractive optical device, including: production, in a first layer, of at least one inclined general profile approximated by a staircase profile including plural stairsteps; production of the profile including: forming buffer patterns on the first layer and at least one sequence including: forming masking patterns, so each masking pattern includes at least one edge situated above a buffer pattern and covers at least one area of the first layer not masked by the buffer patterns, the forming the masking patterns also defining, for the first layer, plural free areas not masked by the masking patterns or by the buffer patterns; etching the free areas to form trenches in the first layer. The production of the profile also includes: removing the masking patterns, removing the buffer patterns revealing walls previously covered by the buffer patterns, and then an isotropic etching to remove the walls.