The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 27, 2016
Filed:
May. 19, 2014
Shin-etsu Chemical Co., Ltd., Tokyo, JP;
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Abstract
Provided is a quartz glass manufacturing method that involves using one or more burners, supplying hydrogen and oxygen to the one or more burners to generate an oxyhydrogen flame, introducing a silicide into the oxyhydrogen flame, forming a porous base material by depositing silicon dioxide generated from a flame hydrolysis reaction with the silicide, and heating and sintering the porous base material to form transparent glass, the method comprising supplying hydrogen that is stored or made at a normal temperature to the one or more burners; controlling a hydrogen flow rate using a measurement apparatus or control apparatus that performs measurement based on heat capacity of a gas; vaporizing liquid hydrogen stored in a low-temperature storage chamber, and supplying the vaporized liquid hydrogen to the one or more burners as backup hydrogen; switching from the hydrogen to the backup hydrogen; and when switching, adjusting the hydrogen flow rate to a value obtained by multiplying the hydrogen flow rate immediately after switching by a predetermined correction coefficient.