The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 27, 2016

Filed:

Sep. 04, 2013
Applicants:

Basf SE, Ludwigshafen, DE;

Empa—eidgenossische Materialprufungs- Und Forschungsanstalt, Duebendorf, CH;

Inventors:

Tobias Hintermann, Therwil, CH;

Roman Fasel, Zuerich, CH;

Pascal Ruffieux, Plassalb, CH;

Jinming Cai, Zuerich, CH;

Juan Ramon Sanchez Valencia, Malaga, ES;

Assignees:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C01B 31/04 (2006.01); B82Y 30/00 (2011.01); B82Y 40/00 (2011.01);
U.S. Cl.
CPC ...
C01B 31/0446 (2013.01); B82Y 30/00 (2013.01); B82Y 40/00 (2013.01); C01B 31/0438 (2013.01); C01B 2204/06 (2013.01);
Abstract

The present invention relates to a process for preparing a graphene nanoribbon, which comprises: (a) providing at least one aromatic monomer compound which is selected from at least one polycyclic aromatic monomer compound, at least one oligo phenylene aromatic monomer compound, or combinations thereof, on a solid substrate, (b) polymerization of the aromatic monomer compound so as to form at least one polymer on the surface of the solid substrate, (c) at least partially cyclodehydrogenating the one or more polymers of step (b), wherein at least step (b) is carried out at a total pressure p(total) of at least 1×10mbar; and a partial oxygen pressure p(O) and partial water pressure p(HO) which satisfy the following relation: p(O)×p(H20)<3×10mbar.


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