The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 27, 2016
Filed:
Nov. 07, 2014
Applicant:
The Chinese University of Hong Kong, Hong Kong, CN;
Inventors:
Assignee:
THE CHINESE UNIVERSITY OF HONG KONG, Hong Kong, CN;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 41/09 (2006.01); B82Y 40/00 (2011.01); H02N 2/00 (2006.01); H02N 2/02 (2006.01);
U.S. Cl.
CPC ...
B82Y 40/00 (2013.01); H02N 2/0095 (2013.01); H02N 2/028 (2013.01);
Abstract
A compliant apparatus for nano-manufacture, including a stage for supporting the objects to be nano-manufactured. The stage includes at least one flexural beam and at least one actuator coupled to the flexural beam; and the actuator is configured to generate and apply axial loads onto the flexural beam, such that a natural frequency of the flexural beam is shifted in response to the generated axial loads, so as to allow trade-offs between the natural frequency and a stroke of the stage for nano-manufacturing the objects.