The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 27, 2016

Filed:

Sep. 03, 2013
Applicants:

Indian Institute of Technology Kanpur, Kanpur, Uttar Pradesh, IN;

Jawaharlal Nehru Centre for Advanced Scientific Research, Bangalore, Karnataka, IN;

Inventors:

Ashutosh Sharma, Uttar Pradesh, IN;

Ankur Verma, Uttarakhand, IN;

Giridhar U. Kulkarni, Karnataka, IN;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B81C 99/00 (2010.01); B29C 59/16 (2006.01); B23K 26/00 (2014.01); B29C 35/08 (2006.01);
U.S. Cl.
CPC ...
B81C 99/0025 (2013.01); B23K 26/0006 (2013.01); B23K 26/0084 (2013.01); B29C 59/16 (2013.01); B23K 2203/42 (2015.10); B29C 2035/0838 (2013.01);
Abstract

Methods and devices for preparing microscale polymer relief structures from a thin polymer layer on an absorbing substrate are described. The described methods are ultrafast (about 8 nanoseconds) and allow formation of patterned microstructures having complex morphologies and narrow line widths that are an order of magnitude smaller than the masks used in the methods.


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