The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 27, 2016
Filed:
Dec. 03, 2014
Dow Global Technologies Llc, Midland, MI (US);
Gerald Drouin Corcoran, Santa Clara, CA (US);
Rashi Tiwari, Missouri City, TX (US);
Chad V. Schuette, Freeland, MI (US);
Peter J. Schulz, Midland, MI (US);
Mark O. Labonville, Sanford, MI (US);
Jim M. Grider, Jr., Colon, MI (US);
Dow Global Technologies LLC, Midland, MI (US);
Abstract
A hydroclone comprising: a tank () including a fluid inlet (), a filtered fluid outlet () and an inner peripheral wall () enclosing at least one chamber (); a filter assembly () located within the chamber () and comprising a circular filter screen () centered about an axis (X); and a cleaning assembly () comprising at least one cleaning member () biased against and adapted to rotate about the periphery () of the filter screen (); and at least one of: a) the filter screen () is reversibly deformable a radial distance (D) of from 0.1 to 10 times the average pore size by the cleaning member () biased against the periphery () of the filter screen (); and b) a compressive member () providing a continuous radially inward force that biases the cleaning member () against the periphery () of the filter screen ().