The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 27, 2016

Filed:

Apr. 14, 2016
Applicant:

Olympus Corporation, Tokyo, JP;

Inventors:

Tetsuya Yamamoto, Saitama, JP;

Fuminori Wake, Kanagawa, JP;

Shunsuke Motosugi, Tokyo, JP;

Assignee:

OLYMPUS CORPORATION, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A61B 18/14 (2006.01); A61B 18/12 (2006.01); A61B 18/00 (2006.01);
U.S. Cl.
CPC ...
A61B 18/14 (2013.01); A61B 18/12 (2013.01); A61B 2018/00083 (2013.01); A61B 2018/1475 (2013.01); A61B 2217/007 (2013.01);
Abstract

Provided is a high-frequency treatment tool including a cylindrical sheath, an electrode member that is made to protrude and be retracted with respect to a distal-end portion of the sheath, and a liquid-feeding unit for feeding a liquid toward the distal-end side inside a flow channel in the sheath, wherein a distal end of the electrode member is provided with a distal-end expanded portion that extends radially outward in a radiating manner and that has a base-end surface that is made to protrude and be retracted with respect to a distal-end portion of the sheath, wherein the sheath is provided with a restricting portion that restricts the movement of the electrode member toward the base-end side at a position at which a portion of the distal-end expanded portion is accommodated inside the sheath and an accommodating portion that can accommodate at least a portion of the distal-end expanded portion.


Find Patent Forward Citations

Loading…