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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9525019 B1

PDFFull Text
Date of Patent:
Dec. 20, 2016

Filed:

Sep. 25, 2013

Method for manufacturing a polycrystalline dielectric layer

Applicant:

Stmicroelectronics (Crolles 2) Sas, Crolles, FR;

Inventor:

Mickael Gros-Jean, Grenoble, FR;

Assignee:

STMICROELECTRONICS (CROLLES 2) SAS, Crolles, FR;

Attorney:

Seed IP Law Group LLP

Primary Examiner:

Eric Thomas

Assistant Examiner:

Arun Ramaswamy

Int. Cl.
CPC ...
H01G 4/06 (2006.01); H01G 4/20 (2006.01); H01L 49/02 (2006.01); C23C 16/40 (2006.01); C23C 16/455 (2006.01); H01G 4/08 (2006.01); H01G 4/12 (2006.01); H01G 4/33 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
H01L 28/40 (2013.01); C23C 16/405 (2013.01); C23C 16/45529 (2013.01); C23C 16/45542 (2013.01); H01G 4/085 (2013.01); H01G 4/1209 (2013.01); H01G 4/33 (2013.01); H01L 21/0228 (2013.01); H01L 21/02189 (2013.01); H01L 21/02274 (2013.01); Y10T 29/42 (2015.01); Y10T 29/43 (2015.01); Y10T 29/435 (2015.01);
Abstract

A method manufactures a capacitor having polycrystalline dielectric layer between two metallic electrodes. The dielectric layer is formed by a polycrystalline growth of a dielectric metallic oxide on one of the metallic electrodes. At least one polycrystalline growth condition of the dielectric oxide is modified during the formation of the polycrystalline dielectric layer, which results in a variation of the polycrystalline properties of the dielectric oxide within the thickness of said layer.

Find Patent Forward Citations

Gros-Jean, Mickael. (2016). Method for manufacturing a polycrystalline dielectric layer (U.S. Patent No. 9525019). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9525019

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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