The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 20, 2016

Filed:

Mar. 28, 2014
Applicant:

Fujitsu Semiconductor Limited, Yokohama, Kanagawa, JP;

Inventor:

Yasunobu Torii, Kuwana, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 29/78 (2006.01); H01L 27/092 (2006.01); H01L 21/336 (2006.01); H01L 29/00 (2006.01); H01L 29/06 (2006.01); H01L 21/761 (2006.01); H01L 21/8238 (2006.01);
U.S. Cl.
CPC ...
H01L 21/761 (2013.01); H01L 21/823857 (2013.01); H01L 21/823878 (2013.01); H01L 21/823892 (2013.01); H01L 27/0922 (2013.01); H01L 27/0928 (2013.01);
Abstract

There are included: forming element isolation regions in a semiconductor substrate; introducing a first impurity of a first conductivity type, to thereby form a first well and a second well of the first conductivity type; introducing a second impurity of a second conductivity type, to thereby form a third well of the second conductivity type and introducing the second impurity into a region between the first well and the second well, to thereby form a separation well of the second conductivity type; and further introducing a third impurity of the second conductivity type into the region between the first well and the second well.


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