The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 20, 2016

Filed:

Dec. 19, 2012
Applicant:

Daifuku Co., Ltd., Osaka-shi, JP;

Inventors:

Masahiro Takahara, Gamo-gun, JP;

Toshihito Ueda, Gamo-gun, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/673 (2006.01); B65B 31/04 (2006.01); H01L 21/677 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67393 (2013.01); B65B 31/04 (2013.01); H01L 21/67769 (2013.01);
Abstract

An inactive gas introducing facility includes an introducing device disposed in a support portion supporting a container accommodating a substrate and configured for introducing inactive gas to the inside of the container through a gas feed opening of the container with discharging gas present inside the container to the outside through a gas discharge opening of the container and a controller for controlling operation of the introducing device. The introducing device is capable of varying the feed rate of the inactive gas. The controller is configured to control the operation of the introducing device such that in the feeding of the inactive gas to the container supported to the support portion, the feed rate is increased progressively to a target feed rate.


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