The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 20, 2016
Filed:
Apr. 25, 2016
Applicant:
SK Hynix Inc., Gyeonggi-do, KR;
Inventors:
Keun Do Ban, Gyeonggi-do, KR;
Cheol Kyu Bok, Gyeongsangbuk-do, KR;
Jung Gun Heo, Daejeon, KR;
Hong Ik Kim, Gyeonggi-do, KR;
Assignee:
SK Hynix Inc., Gyeonggi-do, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01); G03F 7/16 (2006.01); G03F 7/20 (2006.01); G03F 7/32 (2006.01); C09D 153/00 (2006.01); G03F 7/11 (2006.01); G03F 7/30 (2006.01); G03F 7/40 (2006.01); H01L 21/027 (2006.01); H01L 21/033 (2006.01); H01L 21/311 (2006.01); H01L 21/3213 (2006.01); C08F 293/00 (2006.01); C08L 53/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/168 (2013.01); C09D 153/00 (2013.01); G03F 7/002 (2013.01); G03F 7/11 (2013.01); G03F 7/165 (2013.01); G03F 7/20 (2013.01); G03F 7/30 (2013.01); G03F 7/32 (2013.01); G03F 7/40 (2013.01); H01L 21/0276 (2013.01); H01L 21/0337 (2013.01); H01L 21/31144 (2013.01); H01L 21/32139 (2013.01); C08F 293/00 (2013.01); C08L 53/005 (2013.01);
Abstract
Methods of forming patterns includes guide patterns on a neutral layer. A self-assembling block copolymer (BCP) layer on the guide patterns and the neutral layer. By annealing the self-assembling BCP layer, first polymer block domains and second polymer block domains are formed The guide patterns are formed of a developable antireflective material. The neutral layer is formed of a cross-linked polymeric material.