The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 20, 2016
Filed:
Jul. 06, 2010
Applicants:
Takayuki Fujiwara, Kanagawa, JP;
Seiichi Watanabe, Kanagawa, JP;
Inventors:
Takayuki Fujiwara, Kanagawa, JP;
Seiichi Watanabe, Kanagawa, JP;
Assignee:
FUJIFILM Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B32B 5/00 (2006.01); G02B 3/00 (2006.01); B29D 11/00 (2006.01);
U.S. Cl.
CPC ...
G02B 3/0031 (2013.01); B29D 11/00298 (2013.01); G02B 3/0056 (2013.01); G02B 3/0062 (2013.01); Y10T 428/22 (2015.01);
Abstract
Provided is an element array in which an error in pitch among elements in the element array is absorbed surely in a step of laminating a plurality of element arrays so that each group of the elements arrayed in the laminating direction can be aligned with high accuracy. The element array has a plurality of elements arrayed one-dimensionally or two-dimensionally, and a flexible support formed out of a material richer in elasticity than a material forming the elements. The elements are coupled with one another through the support.