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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9523795 B1

PDFFull Text
Date of Patent:
Dec. 20, 2016

Filed:

Nov. 20, 2012

Antistatic antireflection film, method for manufacturing antistatic antireflection film, polarizing plate and image display device

Applicant:

Fujifilm Corporation, Tokyo, JP;

Inventors:

Daiki Wakizaka, Kanagawa, JP;

Kenichi Fukuda, Kanagawa, JP;

Assignee:

FUJIFILM CORPORATION, Tokyo, JP;

Attorneys:

Jean C. Edwards, Esq.

Edwards Neils LLC

Primary Examiner:

Vivian Chen

Int. Cl.
CPC ...
G02B 1/10 (2015.01); G02B 1/11 (2015.01); C08K 3/36 (2006.01); C08K 7/26 (2006.01); C08K 7/18 (2006.01); C08K 5/17 (2006.01); C09D 5/24 (2006.01); C09D 127/12 (2006.01); C09D 133/14 (2006.01); C09D 133/16 (2006.01); C09D 183/04 (2006.01); C09D 183/06 (2006.01); C08L 27/12 (2006.01); C08L 33/14 (2006.01); C08L 33/16 (2006.01); C08L 83/04 (2006.01); C08L 83/06 (2006.01); G02B 5/30 (2006.01); C08G 77/14 (2006.01); G02B 1/18 (2015.01); C08G 77/24 (2006.01); G02B 1/14 (2015.01); G02B 1/16 (2015.01); C08G 77/04 (2006.01); G02B 1/111 (2015.01); G02B 1/04 (2006.01); C08G 65/00 (2006.01); C09D 5/00 (2006.01); G02B 27/00 (2006.01);
U.S. Cl.
CPC ...
G02B 1/11 (2013.01); C08G 77/04 (2013.01); C08G 77/14 (2013.01); C08G 77/24 (2013.01); C08K 3/36 (2013.01); C08K 5/175 (2013.01); C08K 7/18 (2013.01); C08K 7/26 (2013.01); C08L 27/12 (2013.01); C08L 33/14 (2013.01); C08L 33/16 (2013.01); C08L 83/04 (2013.01); C08L 83/06 (2013.01); C09D 5/24 (2013.01); C09D 127/12 (2013.01); C09D 133/14 (2013.01); C09D 133/16 (2013.01); C09D 183/04 (2013.01); C09D 183/06 (2013.01); G02B 1/04 (2013.01); G02B 1/10 (2013.01); G02B 1/105 (2013.01); G02B 1/111 (2013.01); G02B 1/14 (2015.01); G02B 1/16 (2015.01); G02B 1/18 (2015.01); G02B 5/30 (2013.01); C08G 65/007 (2013.01); C09D 5/006 (2013.01); G02B 27/0006 (2013.01); G02B 2207/121 (2013.01); Y10T 428/249974 (2015.04); Y10T 428/259 (2015.01); Y10T 428/3154 (2015.04); Y10T 428/31935 (2015.04);
Abstract

An antistatic antireflection film, including; a support; a hardcoat layer formed from a composition for a hardcoat layer containing at least a compound having a quaternary ammonium salt group; and a low refractive index layer formed from a composition for a low refractive index layer containing at least the following (a), (b), (c) and (d), in this order, wherein, (a) is an ethylenically unsaturated group-containing fluoropolymer, (b) is a fluorine-containing polyfunctional monomer having a surface free energy of 23 mN/m or more when a film is formed alone, four or less —CFgroups in a molecule, a fluorine content of 30% or more, and at least three reactive functional groups in one molecule, (c) is hollow silica fine particles having an average particle size of 10 nm to 100 nm, and (d) is a compound having a dimethylsiloxane structure.

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