The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 13, 2016

Filed:

Feb. 23, 2016
Applicants:

Tamura Corporation, Tokyo, JP;

Riken, Saitama, JP;

Inventors:

Yoshikatsu Morishima, Tokyo, JP;

Hideki Hirayama, Saitama, JP;

Assignees:

RIKEN, Saitama, JP;

TAMURA CORPORATION, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/66 (2006.01); H01L 21/336 (2006.01); H01L 31/18 (2006.01); H01L 31/0304 (2006.01);
U.S. Cl.
CPC ...
H01L 31/1848 (2013.01); H01L 31/03048 (2013.01); H01L 2924/10344 (2013.01); H01L 2924/10356 (2013.01);
Abstract

A nitride semiconductor template includes a GaOsubstrate, a buffer layer that includes as a main component AlN and is formed on the GaOsubstrate, a first nitride semiconductor layer that includes as a main component AlGaN (0.2<x≦1) and is formed on the buffer layer, a second nitride semiconductor layer that includes as a main component AlGaN (0.2≦y≦0.55, y<x) and is formed on the first nitride semiconductor layer, and a third nitride semiconductor layer that is formed on the second nitride semiconductor layer and includes a multilayer structure including an InAlGaN (0.02≦u1≦0.03, u1+v1+w1=1) layer and InAlGaN (0.02≦u2≦0.03, u2+v2+w2=1, v1+0.05≦v2≦v1+0.2) layers on both sides of the InAlGaN layer.


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