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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9519218 B1

PDFFull Text
Date of Patent:
Dec. 13, 2016

Filed:

Sep. 15, 2015

Resin, resist composition and method for producing resist pattern

Applicant:

Sumitomo Chemical Company, Limited, Tokyo, JP;

Inventors:

Masahiko Shimada, Osaka, JP;

Takashi Nishimura, Osaka, JP;

Koji Ichikawa, Osaka, JP;

Assignee:

SUMITOMO CHEMICAL COMPANY, LIMITED, Tokyo, JP;

Attorney:

Birch, Stewart, Kolasch & Birch, LLP

Primary Examiner:

Sin Lee

Int. Cl.
CPC ...
G03F 7/039 (2006.01); G03F 7/004 (2006.01); G03F 7/20 (2006.01); G03F 7/30 (2006.01); G03F 7/32 (2006.01); G03F 7/38 (2006.01); C08F 222/24 (2006.01); C08F 222/18 (2006.01); C08F 220/22 (2006.01); C08F 214/18 (2006.01); C08F 28/06 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0397 (2013.01); C08F 28/06 (2013.01); C08F 214/186 (2013.01); C08F 220/22 (2013.01); C08F 222/18 (2013.01); C08F 222/24 (2013.01); G03F 7/0045 (2013.01); G03F 7/0046 (2013.01); G03F 7/2041 (2013.01); G03F 7/30 (2013.01); G03F 7/322 (2013.01); G03F 7/325 (2013.01); G03F 7/38 (2013.01); C08F 2222/185 (2013.01); C08F 2222/245 (2013.01);
Abstract

1. A resist composition includes (A1) a resin which includes a structural unit represented by formula (a4), and a structural unit having a sulfonyl group, and the resin has no acid-labile group, (A2) a resin having an acid-labile group, and an acid generator. wherein Rrepresents a hydrogen atom or a methyl group, and Rrepresents a Cto Csaturated hydrocarbon group having a fluorine atom, and a methylene group contained in the saturated hydrocarbon group may be replaced by an oxygen atom or a carbonyl group.

Find Patent Forward Citations

Shimada, Masahiko. (2016). Resin, resist composition and method for producing resist pattern (U.S. Patent No. 9519218). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9519218

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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