The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 13, 2016
Filed:
Oct. 12, 2012
Applicants:
Fundacio Institut DE Ciencies Fotoniques, Castelldefels (Barcelona), ES;
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Inventors:
Assignees:
Fundació Institut de Ciències Fotòniques, Castelldefels (Barcelona), IT;
Cark Zeiss SMT GmbH, Oberkochen, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/22 (2012.01); G03F 1/38 (2012.01); G03F 1/00 (2012.01); B82Y 10/00 (2011.01); B82Y 40/00 (2011.01);
U.S. Cl.
CPC ...
G03F 1/22 (2013.01); B82Y 10/00 (2013.01); B82Y 40/00 (2013.01); G03F 1/146 (2013.01); G03F 1/38 (2013.01);
Abstract
The present inventions relates to a substrate for a photolithographic mask comprising a coating deposited on a rear surface of the substrate, wherein the coating comprises (a) at least one electrically conducting layer, and (b) wherein a thickness of the at least one layer is smaller than 30 nm, preferably smaller than 20 nm, and most preferably smaller than 10 nm.