The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 13, 2016
Filed:
Mar. 05, 2014
Aperture for illuminating micromirror arrays having mirror tilt axis not parallel with an array axis
Palo Alto Research Center Incorporated, Palo Alto, CA (US);
Lars-Erik Swartz, Sunnyvale, CA (US);
David K. Biegelsen, Portola Valley, CA (US);
Patrick Y. Maeda, Mountain View, CA (US);
Palo Alto Research Center Incorporated, Palo Alto, CA (US);
Abstract
A mirror array is positioned in relationship to a high intensity power light source to receive at least a portion of a high intensity light beam and to reflect at least a portion of the high intensity light beam. An aperture plate is positioned between the high intensity power light source and the mirror array. The aperture plate has an open area and an opaque area, the open area including a main portion and a tab portion. The main portion is located on a side of the tab portion distal from an incident light direction of the received high intensity beam of light. The open area is sized and positioned to allow rays of the high intensity beam of light to be passed through the tab portion and reflections of the passed rays of the high intensity beam of light to exit through the main portion.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile