The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 13, 2016
Filed:
Jul. 01, 2014
Peter R. Bossard, Ivyland, PA (US);
Luis Breziner, Ivyland, PA (US);
Paolo Moreschini, Lansdale, PA (US);
Peter R. Bossard, Ivyland, PA (US);
Luis Breziner, Ivyland, PA (US);
Paolo Moreschini, Lansdale, PA (US);
Other;
Abstract
A system and method of taking a sample of hydrogen gas and reducing the hydrogen concentration by a factor greater than 1×10while increasing the partial pressure of the contaminating gases by a factor greater than 100, so that extremely low levels of contamination can be accurately detected. A sample of hydrogen gas is captured. Only the hydrogen gas is removed leaving all the contaminating gases in the collection chamber. This causes the total pressure of the gas sample within the collection chamber to decrease dramatically since most of the gas was hydrogen. All the contaminants remain in the collection chamber. None are lost through pumping. As such, the concentration of contaminants within the remaining sample increases dramatically. The residual partial pressures of the contaminating gases within the collection chamber and can now be measured by a variety of techniques.