The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 13, 2016
Filed:
Jun. 25, 2013
Applicant:
Heraeus Quarzglas Gmbh & Co. KG, Hanau, DE;
Inventors:
Mario Such, Graefenhainichen, DE;
Gerhard Schoetz, Aschaffenburg, DE;
Andreas Langner, Freigericht, DE;
Assignee:
Heraeus Quarzglas GmbH & Co. KG, Hanau, DE;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C09K 11/77 (2006.01); C01B 33/18 (2006.01); C03B 19/06 (2006.01); C09K 11/02 (2006.01); C03C 1/00 (2006.01); C03C 4/12 (2006.01); C03C 3/06 (2006.01);
U.S. Cl.
CPC ...
C09K 11/7706 (2013.01); C01B 33/18 (2013.01); C03B 19/066 (2013.01); C03C 1/006 (2013.01); C03C 3/06 (2013.01); C03C 4/12 (2013.01); C09K 11/025 (2013.01); C03B 2201/06 (2013.01); C03B 2201/32 (2013.01); C03B 2201/34 (2013.01); C03B 2201/36 (2013.01); C03C 3/061 (2013.01); C03C 2201/06 (2013.01); C03C 2201/3488 (2013.01); C03C 2201/36 (2013.01);
Abstract
The invention relates to a method for producing a doped SiOslurry in which an SiOsuspension is brought into interaction with at least one doping solution, wherein the SiOsuspension and/or the doping solution act on one another in the form of an atomized spray, the average droplet diameter of which is in the range between 10 μm and 100 μm. The invention further relates to the use of an SiOslurry doped by the atomized spray method for the production of doped quartz glass, particularly for the production of laser-active quartz glass.