logo

For the Inventor, By the Inventor

The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9514968 B1

PDFFull Text
Date of Patent:
Dec. 06, 2016

Filed:

Mar. 30, 2015

Methods and apparatus for selective oxidation of a substrate

Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Agus Tjandra, San Jose, CA (US);

Christopher S. Olsen, Fremont, CA (US);

Johanes Swenberg, Los Gatos, CA (US);

Lara Hawrylchak, San Jose, CA (US);

Assignee:

APPLIED MATERIALS, INC., Santa Clara, CA (US);

Attorneys:

Moser Taboada

Alan Taboada

Primary Examiner:

Richard Booth

Int. Cl.
CPC ...
H01L 21/00 (2006.01); C23C 16/00 (2006.01); H01L 21/67 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67098 (2013.01); H01L 21/02238 (2013.01); H01L 21/02244 (2013.01); H01L 21/67109 (2013.01); H01L 21/67115 (2013.01); H01L 21/67248 (2013.01);
Abstract

Methods and apparatus for improving selective oxidation against metals in a process chamber are provided herein. In some embodiments, a method of oxidizing a first surface of a substrate disposed in a process chamber having a processing volume defined by one or more chamber walls may include exposing the substrate to an oxidizing gas to oxidize the first surface; and actively heating at least one of the one or more chamber walls to increase a temperature of the one or more chamber walls to a first temperature of at least the dew point of water while exposing the substrate to the oxidizing gas.

Find Patent Forward Citations

Tjandra, Agus. (2016). Methods and apparatus for selective oxidation of a substrate (U.S. Patent No. 9514968). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9514968

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…