The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 06, 2016
Filed:
Apr. 13, 2016
Applicant:
Pixelteq, Inc., Largo, FL (US);
Inventor:
Jeffrey Pool, Largo, FL (US);
Assignee:
PIXELTEQ, INC., Largo, FL (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/44 (2006.01); H01L 21/027 (2006.01); H01L 21/768 (2006.01); H01L 21/285 (2006.01);
U.S. Cl.
CPC ...
H01L 21/0272 (2013.01); H01L 21/2855 (2013.01); H01L 21/76892 (2013.01);
Abstract
A dual coating and lift-off method for protecting patterned dielectric-metal coatings using a 2-layer lithography process that is exposed and developed to create an undercut and then, after the wafer is coated with a metal/dielectric filter ending with an incomplete final layer, the top lithography layer is lifted off exposing metal layer edges and leaving the bottom lithography layer intact on the wafer such that the final filter layer(s) can be deposited to complete the coating and passivate the exposed metal layer edges is disclosed.