The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 06, 2016
Filed:
Oct. 22, 2013
Ecole Polytechnique, Palaiseau, FR;
Centre National DE LA Recherche Scientifique (C.n.r.s), Paris, FR;
Institut National DE LA Recherche Scientifique (Inrs), Quebec, CA;
Julien Fuchs, Paris, FR;
Bruno Albertazzi, Fameck, FR;
Henri Pepin, Pau, FR;
Emmanuel D'Humieres, Talence, FR;
ECOLE POLYTECHNIQUE, Palaiseau, FR;
CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (C.N.R.S.), Paris, FR;
INSTITUT NATIONAL DE LA RECHERCHE SCIENTIFIQUE (INRS), Quebec, CA;
Abstract
The invention relates to a method for generating a focused charged-particle beam, comprising at least the steps of: a) generating a charged-particle beam (); b) emitting a laser pulse (); c) generating a focusing magnetic field structure in a target () by means of an interaction between the laser pulse and the target; and d) making the charged-particle beam penetrate the focusing magnetic field structure at least partially.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile