The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 06, 2016
Filed:
May. 02, 2014
Nikon Corporation, Tokyo, JP;
Hisashi Nishinaga, Saitama, JP;
Ikuo Hikima, Kawasaki, JP;
Mitsunori Toyoda, Taihaku-ku, JP;
Masahiro Nakagawa, Ageo, JP;
Tsuneyuki Hagiwara, Tokyo, JP;
Yasushi Mizuno, Saitama, JP;
Naonori Kita, Ageo, JP;
Osamu Tanitsu, Kumagaya, JP;
Nozomu Emura, Kumagaya, JP;
NIKON CORPORATION, Tokyo, JP;
Abstract
An exposure apparatus irradiates a substrate with light via a projection system and liquid, and includes a stage that moves below the projection system, and a light-receiving element having a light-receiving surface. An optical member provided on the stage has a first surface contacting the liquid when moved to face the projection system, and a second surface contacting a gas and transmitting light having come from the projection system via the liquid and the first surface. The optical member is configured such that at least a large-angle ray of the light, which has an angle with an optical axis of the projection system sufficiently large to undergo total reflection at an end surface of the projection system when the liquid is absent, travels from the projection system to the second surface without passing through gas. The second surface transmits the large-angle ray, which is received by the light-receiving surface.