The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 06, 2016

Filed:

Mar. 28, 2014
Applicants:

SK Innovation Co., Ltd., Seoul, KR;

Unist Academy-industry Research Corporation, Ulsan, KR;

Inventors:

Heung-Joo Shin, Ulsan, KR;

Jeong-Il Heo, Gyeonggi-do, KR;

Yeong-Jin Lim, Busan, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/40 (2006.01); G03F 7/16 (2006.01); G03F 7/20 (2006.01); G03F 7/32 (2006.01); G01N 33/00 (2006.01); B82Y 40/00 (2011.01); G01N 27/327 (2006.01); B82Y 15/00 (2011.01);
U.S. Cl.
CPC ...
G03F 7/40 (2013.01); B82Y 40/00 (2013.01); G01N 27/3278 (2013.01); G01N 33/0004 (2013.01); G03F 7/16 (2013.01); G03F 7/20 (2013.01); G03F 7/32 (2013.01); B82Y 15/00 (2013.01);
Abstract

The present invention provides a method for manufacturing a suspended single carbon nanowire and piled nano-electrode pairs, and a suspended single carbon nanowire and piled nano-electrode pairs manufactured using said method. A suspended single carbon nanowire, which is manufactured at a high yield by the method for manufacturing a suspended single carbon nanowire according to the present invention, has a minimized dimension, and a suspended carbon nanomesh, which is manufactured at a high yield by the method for manufacturing piled nano-electrode pairs according to the present invention, is thin and dense. The present invention also provides a gas sensor or an electrochemical sensor, to which a suspended single carbon nanowire and piled nano-electrode pairs manufactured by the method according to the present invention are applied.


Find Patent Forward Citations

Loading…