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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9513550 B1

PDFFull Text
Date of Patent:
Dec. 06, 2016

Filed:

Sep. 04, 2015

Positive resist composition and pattern forming process

Applicant:

Shin-etsu Chemical Co., Ltd., Tokyo, JP;

Inventors:

Yoshinori Hirano, Annaka, JP;

Hideyoshi Yanagisawa, Annaka, JP;

Assignee:

SHIN-ETSU CHEMICAL CO., LTD., Tokyo, JP;

Attorney:

Westerman, Hattori, Daniels & Adrian, LLP

Primary Examiner:

Mike M Dollinger

Int. Cl.
CPC ...
G03F 7/075 (2006.01); G03F 7/16 (2006.01); G03F 7/20 (2006.01); G03F 7/38 (2006.01); G03F 7/32 (2006.01); C08G 61/02 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0757 (2013.01); C08G 61/02 (2013.01); G03F 7/168 (2013.01); G03F 7/20 (2013.01); G03F 7/322 (2013.01); G03F 7/38 (2013.01); C08G 2261/144 (2013.01); C08G 2261/3424 (2013.01);
Abstract

A positive resist composition comprising an organosiloxane-modified novolak resin, a photosensitive agent, and an organic solvent is provided, the resin comprising structural units having formula (1) wherein Ris an organosiloxy group, and Ris hydrogen or alkyl. The composition is photosensitive, turns alkali soluble in the exposed region, eliminates any film thickness loss after development, and displays improved resistance to electrolytic plating and Odry etching.

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Hirano, Yoshinori. (2016). Positive resist composition and pattern forming process (U.S. Patent No. 9513550). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9513550

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