The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 06, 2016

Filed:

Mar. 19, 2013
Applicant:

Cheil Industries Inc., Gumi-si, Gyeongsangbuk-do, KR;

Inventors:

You-Jung Park, Suwon-si, KR;

Hea-Jung Kim, Suwon-si, KR;

Yo-Choul Park, Suwon-si, KR;

Yong-Woon Yoon, Suwon-si, KR;

Sung-Jae Lee, Suwon-si, KR;

Chul-Ho Lee, Suwon-si, KR;

Youn-Jin Cho, Suwon-si, KR;

Assignee:

Cheil Industries, Inc., Gumi-Si, Gyeongsangbuk-do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/027 (2006.01); G03F 7/16 (2006.01); G03F 7/11 (2006.01); G03F 7/30 (2006.01); G03F 7/36 (2006.01); G03F 7/09 (2006.01); C07C 49/83 (2006.01); C07C 49/798 (2006.01); C07C 49/788 (2006.01); C07C 49/796 (2006.01); C07C 49/835 (2006.01); C07C 49/792 (2006.01);
U.S. Cl.
CPC ...
G03F 7/027 (2013.01); C07C 49/788 (2013.01); C07C 49/792 (2013.01); C07C 49/796 (2013.01); C07C 49/798 (2013.01); C07C 49/83 (2013.01); C07C 49/835 (2013.01); G03F 7/091 (2013.01); G03F 7/094 (2013.01); G03F 7/11 (2013.01); G03F 7/16 (2013.01); G03F 7/30 (2013.01); G03F 7/36 (2013.01);
Abstract

Disclosed are a monomer for a hardmask composition represented by the Chemical Formula 1, a hardmask composition including the monomer, and a method of forming a pattern using the same.


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