The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 06, 2016

Filed:

Mar. 13, 2014
Applicant:

Robert Bosch Gmbh, Stuttgart, DE;

Inventors:

Ashwin Samarao, Mountain View, CA (US);

Gary O'Brien, Palo Alto, CA (US);

Ando Feyh, Palo Alto, CA (US);

Gary Yama, Mountain View, CA (US);

Andrew Graham, Redwood City, CA (US);

Bongsang Kim, Mountain View, CA (US);

Fabian Purkl, Palo Alto, CA (US);

Assignee:

Robert Bosch GmbH, Stuttgart, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/322 (2006.01); B81C 1/00 (2006.01); H01L 23/28 (2006.01);
U.S. Cl.
CPC ...
B81C 1/00285 (2013.01); H01L 21/3223 (2013.01); H01L 21/3225 (2013.01); H01L 23/28 (2013.01); B81C 2201/0115 (2013.01); B81C 2203/0109 (2013.01); B81C 2203/0118 (2013.01); B81C 2203/035 (2013.01);
Abstract

A microelectromechanical system (MEMS) device includes a high density getter. The high density getter includes a silicon surface area formed by porosification or by the formation of trenches within a sealed cavity of the device. The silicon surface area includes a deposition of titanium or other gettering material to reduce the amount of gas present in the sealed chamber such that a low pressure chamber is formed. The high density getter is used in bolometers and gyroscopes but is not limited to those devices.


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