The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 06, 2016

Filed:

Jun. 21, 2011
Applicants:

Kazuhisa Kumazawa, Ichihara, JP;

Hiromoto Shibata, Ichihara, JP;

Inventors:

Kazuhisa Kumazawa, Ichihara, JP;

Hiromoto Shibata, Ichihara, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B29C 33/38 (2006.01); B29C 71/04 (2006.01); B29C 35/08 (2006.01); B29C 59/02 (2006.01); B29K 83/00 (2006.01); B29C 35/02 (2006.01); B29K 105/24 (2006.01);
U.S. Cl.
CPC ...
B29C 33/3878 (2013.01); B29C 35/0805 (2013.01); B29C 59/022 (2013.01); B29C 71/04 (2013.01); B29C 35/02 (2013.01); B29C 2035/0827 (2013.01); B29C 2059/023 (2013.01); B29K 2083/00 (2013.01); B29K 2105/243 (2013.01);
Abstract

The present invention provides a method for producing a replica mold for imprinting use which is inexpensive and has good properties including strength and flexibility. The method for producing a replica mold according to the present invention comprises the steps of: (A) coating a substrate with an organic-inorganic hybrid material; (B) semi-curing the coated surface with heat and/or an electromagnetic ray to produce a substrate for fine raised and depressed pattern formation; (C) pressing a master mold having a predetermined fine raised and depressed pattern formed thereon against the substrate for fine raised and depressed pattern formation by an imprinting method to transfer the fine raised and depressed pattern onto the substrate; and (D) irradiating the substrate for fine raised and depressed pattern formation onto which the fine raised and depressed pattern is transferred with an electromagnetic ray to cure the substrate.


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