The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 29, 2016

Filed:

Jan. 27, 2015
Applicant:

Japan Display Inc., Minato-ku, JP;

Inventor:

Noriyoshi Kanda, Tokyo, JP;

Assignee:

Japan Display Inc., Minato-ku, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 27/12 (2006.01); H01L 29/66 (2006.01); G02F 1/1362 (2006.01); H01L 21/768 (2006.01); G02F 1/1368 (2006.01); G02F 1/1343 (2006.01);
U.S. Cl.
CPC ...
H01L 27/1288 (2013.01); G02F 1/136227 (2013.01); H01L 21/76804 (2013.01); H01L 29/66757 (2013.01); G02F 1/1368 (2013.01); G02F 1/134363 (2013.01); G02F 2001/13685 (2013.01); G02F 2001/134372 (2013.01); G02F 2201/50 (2013.01);
Abstract

Since a film, which is the upper layer of an interlayer insulating film and has a fast etching rate, does not have dense film quality, moisture is entered from the end portion of a substrate, and it is likely that display unevenness and the like occur. A manufacturing method of a display device includes the steps of: forming a first contact hole on the first interlayer film; forming a second interlayer film on the first interlayer film and in the first contact hole, the second interlayer film having a lower layer film and an upper layer film having an etching rate faster than an etching rate of the lower layer film; forming a second contact hole on the second interlayer film; and removing at least a part of the upper layer film.


Find Patent Forward Citations

Loading…