The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 29, 2016
Filed:
Nov. 28, 2012
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Scott Singlevich, Colorado Springs, CO (US);
Kommisetti Subrahmanyam, Singapore, SG;
Tony Davis, Austin, TX (US);
Michael Johnson, Austin, TX (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); H01L 21/66 (2006.01); G01R 31/08 (2006.01); G06F 17/00 (2006.01);
U.S. Cl.
CPC ...
H01L 22/14 (2013.01); G01R 31/08 (2013.01); G06F 17/00 (2013.01); H01J 37/32917 (2013.01); H01J 37/32935 (2013.01); H01L 2924/0002 (2013.01);
Abstract
Methods and systems for accurate arc detection in semiconductor manufacturing tools are disclosed. Such methods and systems provide real-time arc detection and near real-time notification for corrective actions during a semiconductor manufacturing process. Such methods and systems utilize data with high sample rate and wavelet analysis to provide for more accurate arc detection, which leads to more effective and cost efficient semiconductor manufacturing operations.