The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 29, 2016

Filed:

Jun. 01, 2012
Applicants:

Jacob Newman, Palo Alto, CA (US);

Dinesh Kanawade, Sunnyvale, CA (US);

Miriam Schwartz, Los Gatos, CA (US);

Nir Merry, Mountain View, CA (US);

Michael Thomas Haag, Sunnyvale, CA (US);

Inventors:

Jacob Newman, Palo Alto, CA (US);

Dinesh Kanawade, Sunnyvale, CA (US);

Miriam Schwartz, Los Gatos, CA (US);

Nir Merry, Mountain View, CA (US);

Michael Thomas Haag, Sunnyvale, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
H01L 21/6719 (2013.01);
Abstract

Embodiments of the present invention relate to improvements to single-substrate, multi-chamber processing platform architecture for minimizing fabrication facility floor space requirements. Prior art systems require significant floor space around all sides to allow for adequate installation and servicing. Embodiments of the present invention provide platforms that allow for servicing the chambers and supporting systems via a front and rear of the platform allowing multiple, side-by-side platform placement within a fabrication facility, while providing improved serviceability of the platform components.


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