The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 29, 2016

Filed:

Oct. 17, 2013
Applicant:

Mitsubishi Electric Corporation, Chiyoda-ku, JP;

Inventors:

Manabu Yoshimura, Chiyoda-ku, JP;

Takashi Miyamoto, Chiyoda-ku, JP;

Soichiro Kainaga, Chiyoda-ku, JP;

Tsuyoshi Mori, Chiyoda-ku, JP;

Hitoshi Sadakuni, Chiyoda-ku, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01H 33/02 (2006.01); H01H 33/16 (2006.01); H01H 33/24 (2006.01); H01H 33/53 (2006.01); H02B 13/065 (2006.01); H01B 3/00 (2006.01); H02G 5/06 (2006.01); H01B 3/16 (2006.01);
U.S. Cl.
CPC ...
H01H 33/02 (2013.01); H01B 3/16 (2013.01); H01H 33/161 (2013.01); H01H 33/24 (2013.01); H02B 13/065 (2013.01); H02G 5/06 (2013.01); H01B 3/004 (2013.01); H01H 33/168 (2013.01); H01H 33/53 (2013.01); H01H 2223/002 (2013.01); H01H 2223/008 (2013.01); H01H 2239/044 (2013.01);
Abstract

Gas insulated electrical equipment includes: a metal enclosure having an insulating gas introduced therein; a conductor that is accommodated inside the metal enclosure and to which voltage is applied; and an insulating and supporting member insulating and supporting the conductor relative to the metal enclosure. The conductor is circumferentially covered with a dielectric film, and furthermore, a nonlinear resistance film provided on the dielectric film and having a nonlinear volume resistivity decreasing when the nonlinear resistance film is acted on by an electric field higher than a critical value.


Find Patent Forward Citations

Loading…