The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 29, 2016
Filed:
Feb. 19, 2013
Globalfoundries Inc., Grand Cayman, KY;
William C. Arnold, Newburgh, NY (US);
Tamar Eilam, New York, NY (US);
Michael H. Kalantar, Chapel Hill, NC (US);
Alexander V. Konstantinou, New York, NY (US);
Alexander A. Totok, New York, NY (US);
GLOBALFOUNDRIES INC., Grand Cayman, KY;
Abstract
Deployment pattern matching is implemented by accessing a target computing environment model that captures environment modeling parameters relating to resources and resource-resource relationships of a corresponding computing environment and expressing the target computing environment model as a model graph defined by target resource elements and resource-to-resource relationship links. Deployment pattern matching is further implemented by accessing a realization pattern that captures deployment parameters relating to resources and resource-resource relationships of a deployment of interest and expressing the realization pattern as a pattern graph defined by conceptual resource elements and constraints arranged by resource-to-resource relationship links and constraint links. The realization pattern is then evaluated against the target computing environment model by executing at least one pattern matching algorithm that attempts to match the pattern graph to the model graph and information corresponding to results of the evaluation are conveyed.