The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 29, 2016
Filed:
Apr. 04, 2014
Fujifilm Corporation, Minato-ku, Tokyo, JP;
Kunihiko Kodama, Haibara-gun, JP;
Shinji Tarutani, Haibara-gun, JP;
Yuichiro Enomoto, Haibara-gun, JP;
Tadashi Oomatsu, Haibara-gun, JP;
Takayuki Ito, Haibara-gun, JP;
Hirotaka Kitagawa, Haibara-gun, JP;
Akiko Hattori, Haibara-gun, JP;
FUJIFILM Corporation, Tokyo, JP;
Abstract
Provided is the pattern formability and line edge roughness of the resultant substrate. An underlay film composition for imprints comprising a compound (A) and a solvent (B), the compound (A) having at least either one of a group (Ka) capable of covalently bonding and/or interacting with a substrate, and, a group (Kb) capable of covalently bonding and/or interacting with a curable composition for imprints, an Ohnishi parameter (Z) calculated from (equation 1) of 3.8 or larger, and a molecular weight of 400 or larger:the Ohnishi parameter=(total number of atoms)/(number of carbon atoms−number of oxygen atoms).  (Equation 1)