The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 29, 2016
Filed:
Jun. 25, 2015
Applicant:
Samsung Electronics Co., Ltd., Suwon-si, Gyeonggi-do, KR;
Inventors:
Ho-young Kim, Seoul, KR;
Dong-min Kang, Seoul, KR;
Sung-bae Kim, Seongnam-si, KR;
Hoon Han, Anyang-si, KR;
Hong-kwon Youn, Suwon-si, KR;
Hyo-sun Lee, Hwaseong-si, KR;
Young-taek Hong, Hwaseong-si, KR;
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23G 1/02 (2006.01); G03F 1/82 (2012.01); C11D 11/00 (2006.01); C11D 7/26 (2006.01); C11D 7/34 (2006.01); B08B 3/00 (2006.01); B08B 3/04 (2006.01);
U.S. Cl.
CPC ...
G03F 1/82 (2013.01); B08B 3/00 (2013.01); B08B 3/04 (2013.01); C11D 7/26 (2013.01); C11D 7/34 (2013.01); C11D 11/0047 (2013.01);
Abstract
In a method of manufacturing an integrated circuit (IC) device, a photomask is wet-processed using a cleaning composition comprising an organic acid, an oxidizing agent, and deionized water (DIW).
Kim, Ho-young. (2016). Methods of manufacturing integrated circuit devices by using photomask cleaning compositions (U.S. Patent No. 9507255). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9507255
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile