The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 29, 2016
Filed:
Dec. 01, 2014
Applicant:
Semes Co., Ltd., Chungcheongnam-do, KR;
Inventors:
Ki-Bong Kim, Chungcheongnam-do, KR;
Seong-Soo Kim, Chungcheongnam-do, KR;
Woo-Young Kim, Chungcheongnam-do, KR;
Assignee:
SEMES CO., LTD., Chungcheongnam-do, KR;
Primary Examiner:
Int. Cl.
CPC ...
F26B 21/00 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
F26B 21/003 (2013.01); H01L 21/67017 (2013.01); H01L 21/67034 (2013.01); H01L 21/67051 (2013.01);
Abstract
Provided is a substrate treating apparatus. The substrate treating apparatus includes a first unit, a second unit, a supply line connecting the first unit to the second unit to supply a supercritical fluid from the first unit to the second unit, a flow rate adjustment member disposed in the supply line, and a filter disposed in the supply line to remove foreign substances. The supply line disposed between the flow rate adjustment member and the filter is disposed to get out of a straight line.