The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 22, 2016

Filed:

Jun. 27, 2014
Applicants:

Boe Technology Group Co., Ltd., Beijing, CN;

Beijing Boe Display Technology Co., Ltd., Beijing, CN;

Inventors:

Liyan Xu, Beijing, CN;

Ming Tian, Beijing, CN;

Junwei Wang, Beijing, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/027 (2006.01); H01L 21/314 (2006.01); H01L 27/12 (2006.01); G02F 1/1333 (2006.01); G03F 7/00 (2006.01); H01L 21/77 (2006.01); G02F 1/1368 (2006.01);
U.S. Cl.
CPC ...
H01L 27/1262 (2013.01); G02F 1/1333 (2013.01); G03F 7/00 (2013.01); H01L 21/77 (2013.01); H01L 27/1248 (2013.01); G02F 1/1368 (2013.01); H01L 2021/775 (2013.01);
Abstract

A method for forming a thin-film layer pattern, a display substrate and a manufacturing method thereof, and a display device are provided. The method for forming the thin-film layer pattern comprises: forming a first thin-film layer to be patterned on a substrate; forming a first overcoat (OC) layer on a surface of the first thin-film layer; forming a first overcoat layer pattern by beam melting; and removing the first thin-film layer not covered by the first overcoat layer pattern to form a first thin-film layer pattern. The method adopts beam melting process and hence can improve the accuracy and the resolution of the display substrate, improve the product quality and reduce the manufacturing cost.


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